home about THEORY GALLERY projects contacts
 

Our Projects (page 1)

goto Page 2

 

Tandetron

1.7 MV Tandetron Accelerator
This 1.7 MV Tandetron Accelerator was firstly bought by the late Prof. Gillis Holmen for using at the Ion Physics and Semiconductor Laboratory, Department of Physics, Chalmers University of Technology (CTH), Gothenburg, Sweden. In 2000, it was donated to Chiang Mai University by the CTH. In Chiang Mai, it is used both as a MeV ion implanter and for various ion beam analysis (IBA) techniques such as RBS, RBS/Channeling, PIXE and IL. Presently, the accelerator has only one beamline.

Built by : High Voltage Engineering Europa Amersfoort / The Netherlands
Start of operation : 1995
Terminal voltage : 0.1 – 1.7 MV
Beam current : 0.001 – 200 uA
Ion sources : Duoplasmatron and Cs sputter ion sources (from Peabody Scientific, Massachusetts, USA which was funded by the National Research Council of Thailand)
Kinds of ions : Nearly all kinds of ions

  

Varian ION Implanter

This 200-DF4/DF5 Varian Extrion ion implanter was routinely used for many years at the RadioMed Company, Massachusetts, USA before generously donated to Chiang Mai University under the support for transportation cost by the International Atomic Energy Agency (IAEA, Vienna). It has been reinstalled, refurbished and modified by our staff until giving back again the same quality of analysed & scanned ion beam of 10 cm in diameter. It is now ready to use for ion implantation work in the keV region.

Built by : Varian, Massachusetts, USA
Start of operation : No information
Terminal voltage : 25 – 150 kV
Beam current : 10 nA - ............ uA
Ion source : Freeman type ion source (with vaporizer)
Kinds of ions : Various kinds of gaseous ions such as nitrogen, argon etc.

 

Bioengineering Ion Beam Line (CMU3)

The ion beam line was started to build around 2000 based on a 30-kV Danfysik ion implanter especially for the purpose of bioengineering research and application. The beam line is featured with its vertical set-up for convenient biosample holding and irradiation and in-situ AFM measurement capability. The beam line is routinely used for low-energy ion bombardment of biological samples for ion-beam-induced mutation and DNA transfer research.

Built by: ourselves with some key components from Danfysik
Start of operation: 2001
Terminal voltage: 30 kV in maximum
Beam current: up to 100 µA
Ion source: Danfysik 910
Kinds of ions: both gaseous and solid ions

 
 

Plasma Immersion Ion Implantation and Deposition (PIII/D) Facility

The designing and construction of the system were started around 1995 with the advice of the famous ion source expert, Dr. K.N. Leung, Lawrence Berkeley National Laboratory, USA, and followed by consistent upgrading and modification. As one of the most actively used facilities, the equipment has significantly made contributions to PIII/D of diamond-like carbon (DLC) coatings on various materials for industrial and medical applications and research on interaction between ions and biological living materials as well.

Built by: ourselves
Start of operation: 1998
Bias voltage: -30 kV in maximum
Peak current of pulse: order of Ampere
Plasma source: RF
Kinds of ions: gaseous species

  

Ion Beam Neutralizer

The designing and construction of the equipment were started from around 2000 under the advice of Prof. Jürgen Engemann, Wuppertal University, Germany. In the machine, ion beam is produced from an RF ion source and then neutralized in the beam pathway by microwave-generated plasma. The neutralized ion beam is particularly useful for implantation of insulating or semiconducting materials and also for investigation of ion charge effect on material modification. 

Built by: ourselves
Start of operation: 2003
Terminal voltage: 10 kV in maximum
Beam current: order of 10 µA
Ion source: RF for ion beam production and microwave for neutralization plasma generation
Kinds of ions: gaseous kinds

 image

Ion Beam Biology

The ion beam biology (IBB) project is one of the most ambitious research programs in the laboratory. It was launched in 1998 and has throughout been continued. The project generally aims at utilizing ion beam and plasma technology for applications in biology, agriculture, horticulture, medical science and life science. This is a highly interdisciplinary field requiring highly international and inter-departmental collaborations. The project work involves equipment development, technology developments and basic research. A bioengineering-specialized ion beam line has been installed; a conventional ion implanter has been modified for IBB application; and a compact ion implanter is being constructed for large scale IBB operation. The research of the project has established the ion beam biotechnology which has led to successes in ion-beam-induced mutations of local rice, flowers and vegetables and DNA transfer in bacteria and yeasts. The basic research has been focused on investigations of mechanisms involved in the ion-beam-induced mutation and DNA transfer such as low-energy ion interaction with DNA and cell envelope materials. The project has been supported by Thailand Research Fund (TRF), National Research Council of Thailand (NRCT), International Atomic Energy Agency (IAEA) and Chiang Mai University (CMU).      
Home| About| Theory| Gallery| Projects| Contacts
Copyright PBP © 2010. All rights reserved.